CyberOptics Semiconductor has released the WaferSense Airborne Particle Sensor (APS) for wafer processing equipment to the semiconductor market. Said to be the only semiconductor sensor of its kind to identify particle sources in tool, the Airborne Particle Sensor moves through semiconductor process equipment and automation material handing systems to monitor airborne particles, reporting information in real-time to allow engineers to efficiently validate wafer contamination. With a wafer-like shape compatible with existing automation and wireless communication providing real-time data, the sensor speeds tool qualification and release to production. APS reduces time locating particle sources. With real-time views of particle conditions, process engineers can address specific trouble spots and be better prepared to pass particle qualifications on the very first attempt. The metrology device can also be used to establish a baseline and to ensure operations continue on this baseline as part of preventive maintenance. The Airborne Particle Sensor uses a fan to pull non-corrosive gas or air through a channel as a laser illuminates the air/gas stream while particles scatter light onto the sensors photodiode. Compatible with front-ends, coater/developer tracks, deposition and etch equipment, the APS has the ability to detect particles as small as 0.1 um. The automation-friendly semiconductor sensor doesn't require engineers to open chambers or expose ultra-clean process areas to the environment. The sensor can detect particles in real-time without opening the tool.