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Imec produces EUV sensors for ASML’s next-generation lithography tools

Mon, 10/10/2011 - 11:54pm

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Leuven, Belgium – October 11, 2011 – Imec announces that it has successfully qualified a chipset consisting of custom high-quality EUV sensor dies. These are now being integrated in ASML’s NXE:3100 EUV lithography tools in the field, improving the tools’ overlay and critical dimension (CD) tool performance. With this milestone achievement, imec confirms that its CMORE business line is ready to provide its partners with custom specialty chip solutions.

Wafer with EUV sensor dies, produced on imec’s 200mm CMORE lineThe sensors were processed according to ASML’s custom designs and specifications, with focus on superior lifetime and sensitivity to direct and high EUV irradiation doses. Two of the sensors are designed to calibrate, align, and focus tool’s lens systems. They have been integrated in functional sensor modules, and are being integrated in the NXE:3100 machines in the field. A third sensor is designed to monitor the NXE:3300’s EUV dose. The next milestone in progress is to build and qualify the different sensors for the NXE:3300 by the end of 2011.

Via its CMORE initiative, imec offers companies all the services needed to turn innovative ideas into smart packaged microsystem products. The CMORE toolbox contains a wide variety of device technologies on 200mm (e.g. CMOS, Si-photonics, MEMS, image sensors, packaging ...) as well as design, testing and reliability. Next to these EUV sensors, imec CMORE is developing several other customer chip solutions. They include technology from all imec’s strategic areas such as bio-sensing, energy- and power management, and high-end specialty imaging, photolithography among others.

Imec’s services range from feasibility studies over design and technology development to prototyping and low-volume manufacturing. And through its alliances, imec can also offer a path to transfer the technology to a foundry for volume production.

www.imec.be.

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